Use este identificador para citar ou linkar para este item: https://locus.ufv.br//handle/123456789/18942
Tipo: Artigo
Título: Roughness of CdTe thin films grown on glass by hot wall epitaxy
Autor(es): Leal, F.F.
Ferreira, S.O.
Menezes-Sobrinho, I.L.
Faria, T.E.
Abstract: Cadmium telluride films were grown on glass substrates using the hot wall epitaxy (HWE) technique. The samples were polycrystalline with a preferential (111) orientation. Scanning electron micrographs reveal a grain size between 0.1 and 0.5 μm. The surface morphology of the samples was studied by measuring the roughness profile using a stylus profiler. The roughness as a function of growth time and scale size were investigated to determine the growth and roughness exponents, β and α, respectively. From the results we can conclude that the growth surface has a self-affine character with a roughness exponent α equal to 0.69 ± 0.03 and almost independent of growth time. The growth exponent β was equal to 0.38 ± 0.06. These values agree with that determined previously for CdTe(111) films grown on GaAs(100).
Palavras-chave: Roughness of CdTe
Hot wall epitaxy
Editor: Journal of Physics
Tipo de Acesso: IOP Publishing Ltd
URI: https://doi.org/10.1088/0953-8984/17/1/003
http://www.locus.ufv.br/handle/123456789/18942
Data do documento: 10-Dez-2004
Aparece nas coleções:Artigos

Arquivos associados a este item:
Arquivo Descrição TamanhoFormato 
artigo.pdfTexto completo492,72 kBAdobe PDFThumbnail
Visualizar/Abrir


Os itens no repositório estão protegidos por copyright, com todos os direitos reservados, salvo quando é indicado o contrário.