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https://locus.ufv.br//handle/123456789/18942
Tipo: | Artigo |
Título: | Roughness of CdTe thin films grown on glass by hot wall epitaxy |
Autor(es): | Leal, F.F. Ferreira, S.O. Menezes-Sobrinho, I.L. Faria, T.E. |
Abstract: | Cadmium telluride films were grown on glass substrates using the hot wall epitaxy (HWE) technique. The samples were polycrystalline with a preferential (111) orientation. Scanning electron micrographs reveal a grain size between 0.1 and 0.5 μm. The surface morphology of the samples was studied by measuring the roughness profile using a stylus profiler. The roughness as a function of growth time and scale size were investigated to determine the growth and roughness exponents, β and α, respectively. From the results we can conclude that the growth surface has a self-affine character with a roughness exponent α equal to 0.69 ± 0.03 and almost independent of growth time. The growth exponent β was equal to 0.38 ± 0.06. These values agree with that determined previously for CdTe(111) films grown on GaAs(100). |
Palavras-chave: | Roughness of CdTe Hot wall epitaxy |
Editor: | Journal of Physics |
Tipo de Acesso: | IOP Publishing Ltd |
URI: | https://doi.org/10.1088/0953-8984/17/1/003 http://www.locus.ufv.br/handle/123456789/18942 |
Data do documento: | 10-Dez-2004 |
Aparece nas coleções: | Artigos |
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artigo.pdf | Texto completo | 492,72 kB | Adobe PDF | Visualizar/Abrir |
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